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          X-Ray Metrology for Compound Semiconductor

          Bruker provides X-ray metrology tools for both QC monitoring of epi-layer films and for detailed R&D analysis of a wide range of semiconductor films and wafers.

          Bruker’s JV-QC3 and JV-QCVelox feature high-intensity sources and high-dynamic-range detectors for fast throughput and repeatable measurements. They enable rapid feedback on the quality and composition of epilayer films, particularly for GaN and III-V materials. This feedback can be communicated locally or automatically to factory host software.

          The JV-DX X-ray metrology system provides analysis of thin films used for materials research, process development, and quality control. As an advanced, general-purpose X-ray diffractometer, it incorporates all the standard techniques, coupled with industry-leading analysis software. Its combination of capabilities and features makes JV-DX an ideal, multi-application thin-film materials research tool for your current and future metrology needs.

          Lee Hodge Semiconductor testimonial v2
          JV QC3 product image v1

          JV-QC3

          HRXRD for epilayer quality control of GaN LED and III-V materials

          JV QCVelox 3

          JV-QCVelox

          High performance HRXRD for epilayer quality control of GaN LED and III-V materials

          JVDX Tool Image v2

          JV-DX

          X-ray metrology system for the analysis of thin films for materials’ research, process development and quality control

          RADS Software Icon v1

          RADS Software

          Software that enables fast and accurate XRD measurement analysis

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